SINGLE TYPE APPARATUS FOR DRYING A SUBSTRATE AND SINGLE TYPE SYSTEM FOR CLEANING A SUBSTRATE INCLUDING THE SAME
    2.
    发明申请
    SINGLE TYPE APPARATUS FOR DRYING A SUBSTRATE AND SINGLE TYPE SYSTEM FOR CLEANING A SUBSTRATE INCLUDING THE SAME 有权
    用于干燥基材的单一类型装置和用于清洁包括其的基材的单一类型系统

    公开(公告)号:US20140000661A1

    公开(公告)日:2014-01-02

    申请号:US13840942

    申请日:2013-03-15

    CPC classification number: H01L21/67034 H01L21/67028

    Abstract: An apparatus for drying a substrate may include a spin chuck, a drying chamber and a drying fluid line. The spin chuck may be configured to support the substrate. The spin chuck may rotate the substrate. The drying chamber may be configured to receive the spin chuck. The drying chamber may have an inlet, an outlet and a vortex exhaust. A drying fluid may be supplied through the inlet into the drying chamber. The drying fluid may be drained through the outlet. A vortex of the drying fluid may be drained through the vortex exhaust The drying fluid line may be connected to the inlet.

    Abstract translation: 用于干燥基材的装置可以包括旋转卡盘,干燥室和干燥流体管线。 旋转卡盘可以被配置为支撑基板。 旋转卡盘可旋转基底。 干燥室可以构造成接收旋转卡盘。 干燥室可以具有入口,出口和涡流排气。 可以通过入口将干燥流体供应到干燥室中。 干燥流体可以通过出口排出。 干燥流体的涡流可以通过涡流排出物排出。干燥流体管线可以连接到入口。

Patent Agency Ranking