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公开(公告)号:US11183526B2
公开(公告)日:2021-11-23
申请号:US16701750
申请日:2019-12-03
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: In Ho Ro , Doowon Kwon , Seokjin Kwon , Jameyung Kim , Jinyoung Kim , Sungki Min , Kwansik Cho , Mangeun Cho , Ho-Chul Ji
IPC: H01L21/00 , H01L27/146
Abstract: An image sensor including a semiconductor substrate having a first surface and a second surface, and a pixel region having a photoelectric conversion region; a first conductive pattern in a first trench defining the pixel region and extending from the first surface toward the second surface; a second conductive pattern in a second trench shallower than the first trench and defined between a plurality of active patterns on the first surface of the pixel region; a transfer transistor and a plurality of logic transistors on the active patterns; and a conductive line on the second surface and electrically connected to the first conductive pattern.
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公开(公告)号:US20240162256A1
公开(公告)日:2024-05-16
申请号:US18344398
申请日:2023-06-29
Applicant: Samsung Electronics Co., Ltd.
Inventor: Kyoungeun Chang , Sungin Kim , Jameyung Kim , Incheol Cho
IPC: H01L27/146 , H01L29/10 , H01L29/423
CPC classification number: H01L27/14614 , H01L29/1033 , H01L29/4236 , H01L29/42376 , H01L29/4238
Abstract: Provided are an image sensor and an electronic system including the same. An image sensor includes a substrate having a pixel region in which an active region is defined, and a gate electrode on the active region, wherein the active region includes an edge portion extending along an outline of a top surface thereof, the edge portion including a local round edge portion having a first radius of curvature that is greater than a second radius of curvature of other portions of the edge portion, wherein the gate electrode includes a lateral gate portion on a portion of the top surface of the active region, a vertical gate portion on a sidewall of the active region, and a round inner corner portion integrally connected to the lateral gate portion and the vertical gate portion, the round inner corner portion facing the local round edge portion.
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公开(公告)号:US11881496B2
公开(公告)日:2024-01-23
申请号:US17246064
申请日:2021-04-30
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jameyung Kim , Tae-Hun Lee , Dongmo Im , Kwansik Cho
IPC: H01L31/112 , H01L27/146
CPC classification number: H01L27/1463 , H01L27/1462 , H01L27/1464 , H01L27/14621 , H01L27/14623 , H01L27/14627 , H01L27/14636 , H01L27/14645 , H01L27/14689
Abstract: An image sensor includes a substrate, and a pixel separation pattern disposed in the substrate and interposed between a plurality of unit pixels. The plurality of unit pixels include a first unit pixel region and a second unit pixel region adjacent to the first unit pixel region in a first direction. The first unit pixel region and the second unit pixel region respectively include a first transfer gate and a second transfer gate. The pixel separation pattern includes a first pixel separation part interposed between the first unit pixel region and the second unit pixel region, and a second pixel separation part spaced apart from the first pixel separation part in the first direction. A top surface of the first pixel separation part is lower than a top surface of the second pixel separation part.
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公开(公告)号:US12170298B2
公开(公告)日:2024-12-17
申请号:US17562125
申请日:2021-12-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jameyung Kim , Sungin Kim , Dongmo Im
IPC: H01L27/14 , H01L27/146
Abstract: An image sensor includes: a semiconductor substrate including a first surface and a second surface opposite to each other; a buried transfer gate electrode arranged in a transfer gate trench extending from the first surface of the semiconductor substrate into the semiconductor substrate, wherein the buried transfer gate electrode has an upper surface arranged at a level lower than that of the first surface of the semiconductor substrate with respect to the second surface of the semiconductor substrate; and a transfer gate spacer arranged on an upper sidewall of the transfer gate trench and on the buried transfer gate electrode.
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公开(公告)号:US20240355841A1
公开(公告)日:2024-10-24
申请号:US18761524
申请日:2024-07-02
Applicant: Samsung Electronics Co., Ltd.
Inventor: Kyoungeun Chang , Sungin Kim , Jameyung Kim , Incheol Cho
IPC: H01L27/146
CPC classification number: H01L27/14603 , H01L27/14612 , H01L27/1463 , H01L27/14643
Abstract: Provided are an image sensor and an electronic system including the same. An image sensor includes a substrate having a pixel region in which an active region is defined, a gate electrode on the active region, and a source region and a drain region formed in the active region on both sides of the gate electrode, wherein the active region includes an edge portion extending along an outline of a top surface thereof, the edge portion including a local round edge portion having a first radius of curvature that is greater than a second radius of curvature of other portions of the edge portion, and a distance from the local round edge portion to the drain region is less than a distance from the local round edge portion to the source region, wherein the gate electrode includes a round inner corner portion facing the local round edge portion.
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