公开(公告)号：US20190067287A1

公开(公告)日：2019-02-28

申请号：US16176179

申请日：2018-10-31

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Je-Min YOO ,  Sangyoon KIM ,  Woosik KIM ,  Jongmil YOUN ,  Hwasung RHEE ,  Heedon JEONG

IPC: H01L27/092 ,  H01L27/02 ,  H01L21/8238

Abstract: A semiconductor device includes a substrate with a NMOS region and a PMOS region, a device isolation layer on the substrate to define active fins, and gate patterns on the substrate to have a length direction crossing the active fins, wherein the device isolation layer includes diffusion brake regions between respective pairs of the active fins, the diffusion brake regions being disposed adjacent to each other in a width direction of the gate patterns, and wherein a width of the diffusion brake region in the NMOS region is different from a width of the diffusion brake region in the PMOS region.

公开(公告)号：US20180204762A1

公开(公告)日：2018-07-19

申请号：US15828728

申请日：2017-12-01

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sunki MIN ,  Songe KIM ,  Koungmin RYU ,  Je-Min YOO

IPC: H01L21/762 ,  H01L27/092 ,  H01L29/06 ,  H01L21/8238

CPC classification number: H01L21/76229 ,  H01L21/823821 ,  H01L21/82385 ,  H01L21/823878 ,  H01L27/092 ,  H01L27/0924 ,  H01L29/0649 ,  H01L29/0673 ,  H01L29/42392 ,  H01L29/7848 ,  H01L29/78696

Abstract: A semiconductor device includes a substrate having a first active pattern and a second active pattern, the first active pattern including a first recess region dividing an upper portion thereof into a first portion and a second portion, the second active pattern including a second recess region dividing an upper portion thereof into a first portion and a second portion, a first insulating pattern covering an inner sidewall of the first recess region, and a second insulating pattern covering an inner sidewall of the second recess region. The first insulating pattern and the second insulating pattern include the same insulating material, and a volume fraction of the first insulating pattern with respect to a volume of the first recess region is smaller than a volume fraction of the second insulating pattern with respect to a volume of the second recess region.