公开(公告)号：US11048179B2

公开(公告)日：2021-06-29

申请号：US16733325

申请日：2020-01-03

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ho Yu ,  Jinhwan Lee ,  Minseok Choi ,  Jeonggil Kim ,  Jongbin Park ,  Inho Choi

IPC: G03F7/20

Abstract: An apparatus for removing residues from a source vessel in an extreme ultraviolet lithography device, the apparatus including a frame portion, and a heater structure on the frame portion, the heater structure having a head on the frame portion, the head being rotatable in at least one shaft direction, and a heater on the head to dissipate heat toward residues in the source vessel, the heater to apply temperature of 200° C. to 800° C.

公开(公告)号：US11454882B2

公开(公告)日：2022-09-27

申请号：US16922328

申请日：2020-07-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jinhwan Lee ,  Jeonggil Kim ,  Sunghyup Kim

IPC: G03F1/64 ,  G03F1/62

Abstract: A pellicle for a reflective mask includes a pellicle body, a pellicle frame below the pellicle body to support the pellicle body, and a pattern structure in at least a part of a surface of the pellicle body, wherein the pattern structure includes a plurality of patterns.