-
1.发明申请公开(公告)号：US20200098854A1
公开(公告)日：2020-03-26
申请号：US16697484
申请日：2019-11-27
发明人： Jong-Min LEE , Jongryul JUN , Eun A. KIM , Jung-Bum LIM
IPC分类号： H01L49/02 , H01L27/108 , H01L27/08
摘要： Decoupling structures are provided. The decoupling structures may include first conductive patterns, second conductive patterns and a unitary supporting structure that structurally supports the first conductive patterns and the second conductive patterns. The decoupling structures may also include a common electrode disposed between ones of the first conductive patterns and between ones of the second conductive patterns. The first conductive patterns and the common electrode are electrodes of a first capacitor, and the second conductive patterns and the common electrode are electrodes of a second capacitor. The unitary supporting structure may include openings when viewed from a plan perspective. The first conductive patterns and the second conductive patterns are horizontally spaced apart from each other with a separation region therebetween, and none of the openings extend into the separation region.
-
2.发明申请公开(公告)号：US20190172904A1
公开(公告)日：2019-06-06
申请号：US16268185
申请日：2019-02-05
发明人： Jong-Min LEE , Jongryul JUN , Eun A KIM , Jung-Bum LIM
IPC分类号： H01L49/02 , H01L27/08 , H01L27/108
摘要： Decoupling structures are provided. The decoupling structures may include first conductive patterns, second conductive patterns and a unitary supporting structure that structurally supports the first conductive patterns and the second conductive patterns. The decoupling structures may also include a common electrode disposed between ones of the first conductive patterns and between ones of the second conductive patterns. The first conductive patterns and the common electrode are electrodes of a first capacitor, and the second conductive patterns and the common electrode are electrodes of a second capacitor. The unitary supporting structure may include openings when viewed from a plan perspective. The first conductive patterns and the second conductive patterns are horizontally spaced apart from each other with a separation region therebetween, and none of the openings extend into the separation region.
-
搜索结果
2 条记录 (耗时 0.013 秒)
