公开(公告)号：US20240280917A1

公开(公告)日：2024-08-22

申请号：US18468505

申请日：2023-09-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jung Dohyun ,  Youngduk Suh ,  Sungwook Kang ,  Sanggon Shin ,  Seunghee Lee ,  Jinwook Jung

IPC: G03F7/00

CPC classification number: G03F7/70925

Abstract: An apparatus for cleaning an EUV light creation chamber may include a cleaning module, a first movement module and a second movement module. The first movement module may support the cleaning module in the EUV light creation chamber along a first direction. The second movement module may support the first movement module on a surface of the EUV light creation chamber at a position along a second direction perpendicular to the first direction.