公开(公告)号：US20210241446A1

公开(公告)日：2021-08-05

申请号：US16947909

申请日：2020-08-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： KISUNG KIM

IPC: G06T7/00 ,  G06T7/60 ,  G06T7/70

Abstract: A method of verifying optical proximity effect correction includes generating a design pattern layout including a target pattern, generating a correction pattern layout from the design pattern layout by performing optical proximity effect correction, generating a contour image including an image pattern using the correction pattern layout, detecting a defect pattern from the image pattern of the contour image, and correcting the correction pattern layout using data of the defect pattern. Detecting the defect pattern includes acquiring position data of a center of gravity of the target pattern, acquiring position data of a center of gravity of the image pattern, and determining whether the image pattern is a defect pattern by comparing a defect pattern detection reference with a distance between the center of gravity of the target pattern and the center of gravity of the image pattern.

公开(公告)号：US20210365388A1

公开(公告)日：2021-11-25

申请号：US17118091

申请日：2020-12-10

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： YOUNGMIN JO ,  DAESEOK BYEON ,  KISUNG KIM

IPC: G06F12/14 ,  G06F21/72 ,  G06F21/79 ,  G06F21/74 ,  G06F21/85 ,  H04L9/06

Abstract: A method of encrypting data in a nonvolatile memory device (NVM) includes; programming data in selected memory cells, sensing the selected memory cells at a first time during a develop period to provide random data, sensing the selected memory cells at a second time during the develop period to provide main data, encrypting the main data using the random data to generate encrypted main data, and outputting the encrypted main data to an external circuit, wherein the randomness of the random data is based on a threshold voltage distribution of the selected memory cells.