公开(公告)号：US20200208052A1

公开(公告)日：2020-07-02

申请号：US16728276

申请日：2019-12-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kihun SONG ,  Jungmin OH ,  Hyosan LEE ,  Daehyuk CHUNG ,  Minjung KIM ,  Hyojoong YOON

IPC: C09K13/06 ,  H01L21/311

Abstract: An etchant composition for etching a metal film and a method of forming a pattern, the etchant composition including an acid etching agent, the acid etching agent including an inorganic acid or an organic acid; an auxiliary oxidant, the auxiliary oxidant including hydrogen peroxide or an amine oxide compound; and an organic solvent, the organic solvent including a compound having an unshared electron pair, and having a dielectric constant of about 17 to about 80.