公开(公告)号：US20250140595A1

公开(公告)日：2025-05-01

申请号：US18904870

申请日：2024-10-02

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yeontae Kim ,  Yihwan Kim ,  Woohyung Kim ,  Sunwoo Bang ,  Kwanghyun Yang

IPC: H01L21/687 ,  H01J37/32 ,  H01L21/67

Abstract: An apparatus for processing a substrate is provided and includes: a chamber including an internal space; a shower head in the internal space of the chamber; a heater below the shower head; lift pins configured to lift the substrate, relative to the heater, while the substrate is on the heater; a rotation shaft connected to the heater; a rotation driving actuator connected to the rotation shaft and configured to rotate the heater by rotating the rotation shaft; a first lifting driving actuator configured to lift the heater; a lifting member configured to lift the lift pins; and a second lifting driving actuator connected to the lifting member and configured to lift the lift pins, relative to the heater, by lifting the lifting member.