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公开(公告)号:US20170162363A1
公开(公告)日:2017-06-08
申请号:US15286678
申请日:2016-10-06
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: JIN KWAN KIM , MIN KOOK KIM , JUNG SOO KIM , YU SIN YANG , CHUNG SAM JUN
CPC classification number: H01J37/222 , G01N23/2251 , G01N2223/418 , G01N2223/423 , H01J37/244 , H01J37/28 , H01J2237/0473 , H01J2237/226 , H01J2237/24485 , H01J2237/2803 , H01J2237/2804 , H01J2237/2805 , H01J2237/2806
Abstract: A structure analysis method using a scanning electron microscope includes irradiating a sample with an electron beam having a first landing energy to obtain a first image at a first depth of the sample and accelerating the electron beam to have a second landing energy higher than the first landing energy to obtain a second image at a second depth of the sample.