公开(公告)号：US20230377835A1

公开(公告)日：2023-11-23

申请号：US18357904

申请日：2023-07-24

Applicant: FEI Company

Inventor： Bart Jozef Janssen ,  Edwin Verschueren ,  Erik Franken

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J2237/20214 ,  H01J2237/226

Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.

公开(公告)号：US11756762B2

公开(公告)日：2023-09-12

申请号：US17649917

申请日：2022-02-03

Applicant: FEI Company

Inventor： Bart Jozef Janssen ,  Edwin Verschueren ,  Erik Franken

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J2237/20214 ,  H01J2237/226

Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.

公开(公告)号：US20230253179A1

公开(公告)日：2023-08-10

申请号：US17935128

申请日：2022-09-25

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： SUNG MIN NAM ,  Jaeseung Jeong ,  Dongho Kim ,  Seunghune Yang

IPC: H01J37/28 ,  H01J37/22 ,  H01L21/66 ,  G01B11/02

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01L22/12 ,  G01B11/02 ,  H01J2237/2817 ,  H01J2237/223 ,  H01J2237/226 ,  G01B2210/56

Abstract: A pitch walk inspection method includes obtaining a scanning electron microscope (SEM) image for a line and space (L/S) pattern formed by a multi-patterning technology (MPT), where L/S pattern includes a plurality of lines and spaces that are alternately arranged; detecting a main pitch of the L/S pattern in the SEM image; dividing a graph of the main pitch into graphs of component pitches, based on the MPT; performing a Fast Fourier Transform (FFT) on each graph of the component pitches; multiplying a phase and an intensity graph of the FFT of each of the graphs of the component pitches with each other and obtaining compensated FFT phase graphs; and calculating a pitch walk for the L/S pattern by obtaining differences between phase peak values of the compensated FFT phase graphs.

公开(公告)号：US11721519B2

公开(公告)日：2023-08-08

申请号：US17394704

申请日：2021-08-05

Applicant: Synchrotron Research, Inc.

Inventor： Edward Principe ,  Andrew Stevens ,  Conan Weiland ,  Jeffrey Hagen ,  Brian Kempshall ,  Kirk Scammon ,  Zachery Russell ,  Shane Didona ,  Mathieu Therezien ,  Tomas McIntee

IPC: H01J37/28 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J37/265 ,  H01J2237/226 ,  H01J2237/2802

Abstract: A method and a system are for sparse sampling utilizing a programmatically randomized signal for modulating a carrier signal. The system includes a compound sparse sampling pattern generator that generates at least one primary carrier signal, and at least one secondary signal. The at least one secondary signal modulates the at least one primary signal in a randomized fashion.

公开(公告)号：US20190204579A1

公开(公告)日：2019-07-04

申请号：US16233597

申请日：2018-12-27

Applicant: Integrated Dynamic Electron Solutions, Inc.

Inventor： Bryan Reed

IPC: G02B21/36 ,  H01J37/22 ,  G01N23/225 ,  H01J37/26 ,  H01J37/28 ,  G06T11/00

CPC classification number: G02B21/365 ,  G01N23/225 ,  G06T11/003 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/24455 ,  H01J2237/262 ,  H01J2237/2802

Abstract: Methods and systems for temporal compressive sensing are disclosed, where within each of one or more sensor array data acquisition periods, one or more sensor array measurement datasets comprising distinct linear combinations of time slice data are acquired, and where mathematical reconstruction allows for calculation of accurate representations of the individual time slice datasets.

公开(公告)号：US09966225B2

公开(公告)日：2018-05-08

申请号：US15329638

申请日：2014-07-28

Applicant: HITACHI, LTD.

Inventor： Daisuke Bizen ,  Makoto Sakakibara ,  Hiroya Ohta ,  Junichi Tanaka

IPC: H01J37/24 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/244 ,  H01J37/222 ,  H01J37/24 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/226

Abstract: A simulation device calculates a detection number of electrons generated by charged particles radiated to a sample by a simulation and generates a simulation image of the sample. The simulation device holds penetration length information (272) in which incidence conditions of the charged particles and a penetration length are associated with each other, sample configuration information (271) which shows a configuration of a sample, and emission electron number information in which the incidence conditions of the charged particles and an emission electron number are associated with each other. The simulation device calculates the number of electrons emitted from a predetermined incidence point, on the basis of incidence conditions at the predetermined incidence point, the penetration length information (272), the sample configuration information (271), and the emission electron number information.

公开(公告)号：US20180033591A1

公开(公告)日：2018-02-01

申请号：US15660096

申请日：2017-07-26

Applicant: BATTELLE MEMORIAL INSTITUTE

Inventor： Bryan A. Stanfill ,  Sarah M. Reehl ,  Margaret C. Johnson ,  Lisa M. Bramer ,  Nigel D. Browning ,  Andrew J. Stevens ,  Libor Kovarik

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/06

CPC classification number: H01J37/265 ,  H01J37/06 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/226 ,  H01J2237/2814 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2826

Abstract: Disclosed are methods for sensing conditions of an electron microscope system and/or a specimen analyzed thereby. Also disclosed are sensor systems and electron microscope systems able to sense system conditions, and/or conditions of the specimen being analyzed by such systems. In one embodiment, a sparse dataset can be acquired from a random sub-sampling of the specimen by an electron beam probe of the electron microscope system. Instrument parameters, specimen characteristics, or both can be estimated from the sparse dataset.

公开(公告)号：US20170213355A1

公开(公告)日：2017-07-27

申请号：US15332573

申请日：2016-10-24

Applicant: NORTHWESTERN UNIVERSITY

Inventor： Karl A. Hujsak ,  Vinayak P. Dravid ,  Benjamin D. Myers

IPC: G06T7/60

CPC classification number: H01J37/222 ,  G06T5/005 ,  G06T2207/10061 ,  G06T2207/20081 ,  H01J2237/226 ,  H01J2237/2803

Abstract: Aspects of the present disclosure involve a data capturing and processing system that intentionally captures data and/or data sets with missing pieces of information. The data and/or datasets may include various types of data, such as one-dimensional signals, two-dimensional images (or other images), and/or three-dimensional structures. The captured data is processed to restore missing information into the data and/or data sets, thereby enabling simultaneous pattern recognition and image recovery.

公开(公告)号：US09715992B2

公开(公告)日：2017-07-25

申请号：US14390095

申请日：2013-04-02

Applicant: DELMIC B.V. ,  Jacob Pieter Hoogenboom ,  Pieter Kruit ,  Nalan M. SC Liv ,  Aernout Christiaan Zonnevylle

Inventor： Jacob Pieter Hoogenboom ,  Pieter Kruit ,  Nalan Liv ,  Aernout Christiaan Zonnevylle

IPC: H01J37/22 ,  G01C21/32 ,  H01J37/28 ,  G01C21/34

CPC classification number: H01J37/222 ,  G01C21/32 ,  G01C21/3484 ,  H01J37/22 ,  H01J37/226 ,  H01J37/228 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/24475 ,  H01J2237/2806

Abstract: An apparatus for inspecting a sample, is equipped with a charged particle column for producing a focused beam of charged particles to observe or modify the sample, and an optical microscope to observe a region of interest on the sample as is observed by the charged particle beam or vice versa. The apparatus is accommodated with a processing unit adapted and equipped to represent an image as generated with the column and an image as generated with the microscope. The unit is further adapted to perform an alignment procedure mutually correlating a region of interest in one of the images, wherein the alignment procedure involves detecting a change in the optical image as caused by the charged particle beam.

公开(公告)号：US09633819B2

公开(公告)日：2017-04-25

申请号：US14117256

申请日：2012-05-14

Applicant: Michael William Phaneuf ,  Ken Guillaume Lagarec

Inventor： Michael William Phaneuf ,  Ken Guillaume Lagarec

IPC: H01J37/28 ,  H01J37/26 ,  H01J37/22 ,  H01J37/30 ,  H01J37/305

CPC classification number: H01J37/26 ,  H01J37/222 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/226 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: Generally, the present disclosure provides a method and system for improving imaging efficiency for CPB systems while maintaining or improving imaging accuracy over prior CPB systems. A large field of view image of a sample is acquired at a low resolution and thus, at high speed. The low resolution level is selected to be sufficient for an operator to visually identify structures or areas of interest on the low resolution image. The operator can select one or more small areas of arbitrary shape and size on the low resolution image, referred to as an exact region of interest (XROI). The outline of the XROI is mapped to an x-y coordinate system of the image, and the CPB system is then controlled to acquire a high resolution image of only the XROI identified on the low resolution image. For 3D imaging, once the XROI is identified, each section of the sample can be iteratively imaged in the previously described manner, with the operator having the option to redefine the XROI later.