公开(公告)号：US12080515B2

公开(公告)日：2024-09-03

申请号：US17718225

申请日：2022-04-11

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zong-wei Chen

IPC: H01J37/28 ,  H01J37/06 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1474 ,  H01J2237/0492 ,  H01J2237/083 ,  H01J2237/1501 ,  H01J2237/2806

Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.

公开(公告)号：US20230326714A1

公开(公告)日：2023-10-12

申请号：US18027051

申请日：2021-08-04

Applicant: V TECHNOLOGY CO., LTD.

Inventor： Michinobu MIZUMURA

IPC: H01J37/28 ,  H01J37/317 ,  H01J37/32 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/3178 ,  H01J37/32449 ,  H01J37/244 ,  H01J37/226 ,  H01J2237/2817 ,  H01J2237/2806

Abstract: A metal pattern inspection method which applies a pulsed voltage to a metallic pattern, sets a cycle of the pulsed voltage to be shorter than a scanning cycle in which a focused ion beam is swept, indicating only a region of a secondary charged particle image corresponding to a portion of the metallic pattern which is isolated by a wire breakage and to which the pulsed voltage is applied in the form of a first pattern created as a function of surface electrical potentials changing in level with time, detecting, as a disconnection, a boundary between the first pattern and a second pattern created as a function of surface electrical potentials not changing in level with time, and determining whether there is a breaking of or a short circuit in the metallic pattern based on the presence or absence of the disconnection.

公开(公告)号：US11657999B2

公开(公告)日：2023-05-23

申请号：US17353333

申请日：2021-06-21

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert

IPC: H01J37/10 ,  H01J37/244 ,  H01J37/28 ,  H01J37/29 ,  H01J37/05

CPC classification number: H01J37/10 ,  H01J37/05 ,  H01J37/244 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/0453 ,  H01J2237/24465 ,  H01J2237/24485 ,  H01J2237/24507 ,  H01J2237/24564 ,  H01J2237/24585 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/2857

Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.

公开(公告)号：US10332718B1

公开(公告)日：2019-06-25

申请号：US16254203

申请日：2019-01-22

Applicant: IMATREX, INC.

Inventor： Roy E. Rand ,  Vitaliy Ziskin

IPC: H01J37/147 ,  H01J37/153 ,  H01J37/08 ,  H01J37/317 ,  H01J37/26

CPC classification number: H01J37/1475 ,  H01J29/66 ,  H01J29/76 ,  H01J35/14 ,  H01J37/08 ,  H01J37/14 ,  H01J37/153 ,  H01J37/266 ,  H01J37/3174 ,  H01J2237/1526 ,  H01J2237/2806 ,  H01J2237/31749

Abstract: A particle beam device including a magnet, the device including: a particle beam source configured to emit electron and ion beams; a plurality of yokes arranged in a substantially rectangular shape; a coil set including a plurality of coils, wherein windings of the plurality of coils are uniformly distributed across and wound around the plurality of yokes, wherein the coil set is configured to produce both dipole and quadrupole fields, wherein the magnet is configured to deflect and focus electron and ion beams.

公开(公告)号：US20190057833A1

公开(公告)日：2019-02-21

申请号：US16042871

申请日：2018-07-23

Applicant: Hermes Microvision, Inc.

Inventor： Shuai LI

IPC: H01J37/143 ,  H01J37/28 ,  H01J37/09 ,  H01J3/20 ,  H01J37/065 ,  H01J37/14 ,  H01J37/063

CPC classification number: H01J37/143 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/09 ,  H01J37/14 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/063 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/0653 ,  H01J2237/083 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

公开(公告)号：US20180350555A1

公开(公告)日：2018-12-06

申请号：US15925606

申请日：2018-03-19

Applicant: Hermes Microvision, Inc.

Inventor： Shuai LI ,  Weiming REN ,  Xuedong LIU ,  Juying DOU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/244 ,  H01J37/20

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US20180286630A1

公开(公告)日：2018-10-04

申请号：US15902157

申请日：2018-02-22

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Hidekazu Takekoshi

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/26 ,  H01J37/153

CPC classification number: H01J37/26 ,  H01J37/153 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/153 ,  H01J2237/2002 ,  H01J2237/248 ,  H01J2237/2806 ,  H01J2237/2809 ,  H01J2237/2817 ,  H01J2237/2826

Abstract: A multi charged particle beam inspection apparatus includes a plurality of sensors, arranged inside or on a periphery of a secondary electron image acquisition mechanism, to measure a plurality of interfering factors, a determination circuit to determine, for each interfering factor, whether change exceeding a corresponding threshold is a first case which returns to the original state within a predetermined time period, or a second case which does not return to the original state even if the predetermined time period has passed, and a comparison circuit to input a reference image of a region corresponding to the secondary electron image acquired, and compare the secondary electron image with the reference image, wherein in the case where change of the second case occurs, the secondary electron image acquisition mechanism suspends the acquisition operation of the secondary electron image, and calibrates a change amount of the multiple charged particle beams.

公开(公告)号：US20180269029A1

公开(公告)日：2018-09-20

申请号：US15982175

申请日：2018-05-17

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tomokazu KOZAKAI ,  Fumio ARAMAKI ,  Osamu MATSUDA ,  Kensuke SHIINA ,  Kazuo AITA ,  Anto YASAKA

IPC: H01J37/22 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/20 ,  H01J2237/202 ,  H01J2237/2067 ,  H01J2237/226 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: Disclosed herein is a method for acquiring an image, in which an image reducing the influence of electrification of a substrate is easily acquired. The method, in which an image of an image acquiring region is acquired by radiating an ion beam to a sample having a conducting part with a linear edge on a dielectric substrate, includes: performing an equal-width scan caused by the ion beam in a first direction that obliquely intersects the edge and sweep in a second direction intersecting the first direction, and radiating the ion beam to a scan region of a parallelogram shape wider than the image acquiring region; detecting secondary charged particles to generate image data of the scan region; calculating the image data of the scan region to generate image data of the image acquiring region; and displaying the image data of the image acquiring region.

公开(公告)号：US10020160B2

公开(公告)日：2018-07-10

申请号：US15417887

申请日：2017-01-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Koichi Kuroda ,  Hajime Kawano ,  Makoto Suzuki ,  Yuzuru Mizuhara

IPC: G01N23/00 ,  H01J37/00 ,  H01J3/10 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2806 ,  H01J2237/2815

Abstract: An object of the present invention is to provide a charged particle beam device which can realize improved contrast of an elongated pattern in a specific direction, such as a groove-like pattern. In order to achieve the above-described object, the present invention proposes a charged particle beam device including a detector for detecting a charged particle obtained based on a charged particle beam discharged to a sample. The charged particle beam device includes a charged particle passage restricting member that has at least one of an arcuate groove and a groove having a longitudinal direction in a plurality of directions, and a deflector that deflects the charged particle discharged toward the groove from the sample. The charged particle discharged from the sample is deflected to a designated position of the groove.

公开(公告)号：US20180190469A1

公开(公告)日：2018-07-05

申请号：US15741038

申请日：2015-07-01

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Zhaohui CHENG ,  Tomonori NAKANO ,  Kotoko URANO ,  Takeyoshi OHASHI ,  Yasunari SOHDA ,  Hideyuki KAZUMI

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/141 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/153 ,  H01J37/141 ,  H01J37/1471 ,  H01J37/1474 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/1536 ,  H01J2237/221 ,  H01J2237/26 ,  H01J2237/2806 ,  H01J2237/2809

Abstract: In order to provide an aberration correction system that realizes a charged particle beam of which the anisotropy is reduced or eliminated on a sample surface even in the case where there is magnetic interference between pole stages of an aberration corrector, an correction system includes a line cross position control device (209) which controls a line cross position in the aberration corrector of the charged particle beam so that a designed value and an actually measured value of the line cross position are equal to each other, an image shift amount extraction device (210), and a feedback determination device (211) which determines whether or not changing an excitation amount of the aberration corrector is necessary whether or not changing an excitation amount is necessary from an extracted image shift amount.