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公开(公告)号:US11437315B2
公开(公告)日:2022-09-06
申请号:US16774082
申请日:2020-01-28
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Tae-hyung Kim , Jung-ho Do , Dae-young Moon , Sang-yeop Baeck , Jae-hyun Lim , Jae-seung Choi , Sang-shin Han
IPC: H01L23/528 , H01L27/088 , H01L27/118 , H01L23/522 , H01L27/092 , H01L27/02 , H01L29/417 , H01L29/45 , H01L29/78 , H01L21/8238 , H01L21/768 , H01L21/8234
Abstract: Provided is an integrated circuit which includes: a plurality of conductive lines extending in a first horizontal direction on a plane separate from a gate line, and including first and second conductive lines; a source/drain contact having a bottom surface connected to a source/drain region, and including a lower source/drain contact and an upper source/drain contact which are connected to each other in a vertical direction; and a gate contact having a bottom surface connected to the gate line, and extending in the vertical direction, in which the upper source/drain contact is placed below the first conductive line, and the gate contact is placed below the second conductive line. A top surface of the lower source/drain contact may be larger than a bottom surface of the upper source/drain contact.
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2.
公开(公告)号:US20180294219A1
公开(公告)日:2018-10-11
申请号:US15909212
申请日:2018-03-01
Applicant: Samsung Electronics Co., Ltd.
Inventor: Tae-hyung Kim , Jung-ho Do , Dae-young Moon , Sang-yeop Baeck , Jae-hyun Lim , Jae-seung Choi , Sang-shin Han
IPC: H01L23/528 , H01L29/417 , H01L29/45
CPC classification number: H01L23/528 , H01L21/823475 , H01L21/823871 , H01L23/5226 , H01L27/0207 , H01L27/088 , H01L27/092 , H01L27/11807 , H01L29/41775 , H01L29/45 , H01L29/78 , H01L2027/11875
Abstract: Provided is an integrated circuit which includes: a plurality of conductive lines extending in a first horizontal direction on a plane separate from a gate line, and including first and second conductive lines; a source/drain contact having a bottom surface connected to a source/drain region, and including a lower source/drain contact and an upper source/drain contact which are connected to each other in a vertical direction; and a gate contact having a bottom surface connected to the gate line, and extending in the vertical direction, in which the upper source/drain contact is placed below the first conductive line, and the gate contact is placed below the second conductive line. A top surface of the lower source/drain contact may be larger than a bottom surface of the upper source/drain contact.
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3.
公开(公告)号:US20200168542A1
公开(公告)日:2020-05-28
申请号:US16774082
申请日:2020-01-28
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Tae-hyung Kim , Jung-ho Do , Dae-young Moon , Sang-yeop Baeck , Jae-hyun Lim , Jae-seung Choi , Sang-shin Han
IPC: H01L23/528 , H01L29/45 , H01L29/417 , H01L21/8238 , H01L27/02 , H01L27/092 , H01L23/522 , H01L27/118 , H01L27/088
Abstract: Provided is an integrated circuit which includes: a plurality of conductive lines extending in a first horizontal direction on a plane separate from a gate line, and including first and second conductive lines; a source/drain contact having a bottom surface connected to a source/drain region, and including a lower source/drain contact and an upper source/drain contact which are connected to each other in a vertical direction; and a gate contact having a bottom surface connected to the gate line, and extending in the vertical direction, in which the upper source/drain contact is placed below the first conductive line, and the gate contact is placed below the second conductive line. A top surface of the lower source/drain contact may be larger than a bottom surface of the upper source/drain contact.
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公开(公告)号:US10580733B2
公开(公告)日:2020-03-03
申请号:US15909212
申请日:2018-03-01
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Tae-hyung Kim , Jung-ho Do , Dae-young Moon , Sang-yeop Baeck , Jae-hyun Lim , Jae-seung Choi , Sang-shin Han
IPC: H01L23/528 , H01L27/088 , H01L27/118 , H01L23/522 , H01L27/092 , H01L27/02 , H01L29/417 , H01L29/45 , H01L29/78 , H01L21/8238 , H01L21/8234
Abstract: Provided is an integrated circuit which includes: a plurality of conductive lines extending in a first horizontal direction on a plane separate from a gate line, and including first and second conductive lines; a source/drain contact having a bottom surface connected to a source/drain region, and including a lower source/drain contact and an upper source/drain contact which are connected to each other in a vertical direction; and a gate contact having a bottom surface connected to the gate line, and extending in the vertical direction, in which the upper source/drain contact is placed below the first conductive line, and the gate contact is placed below the second conductive line. A top surface of the lower source/drain contact may be larger than a bottom surface of the upper source/drain contact.
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