公开(公告)号：US20230043451A1

公开(公告)日：2023-02-09

申请号：US17737490

申请日：2022-05-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yongmyung JUN ,  Hyunjin KO ,  Seohyun KIM ,  Jae Seong RYU ,  Inkwang BAE ,  Seungbu BAEK

IPC: H01L21/687 ,  H01L21/67

Abstract: A substrate processing chamber includes a housing providing a process space; a spin apparatus provided in the housing; and a fluid spraying nozzle configured to spray fluid into the process space, wherein the spin apparatus includes: a spin chuck configured to support a substrate; a rotation driving part configured to rotate the spin chuck; and a weight sensor configured to measure a weight of the substrate supported on the spin chuck.

公开(公告)号：US20230046595A1

公开(公告)日：2023-02-16

申请号：US17854191

申请日：2022-06-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seohyun KIM ,  Ohchel KWON ,  Sangwoo KIM ,  Youngchan KIM ,  Hyunchul KIM ,  Hyunwoo NHO ,  Jaeseong RYU ,  Seungbu BAEK ,  Yongmyung JUN ,  Hyeongkwon JEONG ,  Daewoong CHOI

IPC: H01L21/67

Abstract: A supercritical fluid processing apparatus including a supercritical fluid supply module including a gas liquefier to liquefy a gas transferred from a gas supply and provide a liquefied fluid, a storage tank to change the liquefied fluid to a supercritical state and store a supercritical fluid, and an internal pipe connecting the gas liquefier to the storage tank; an exhaust fluid supply module including an exhaust fluid liquefier including a regeneration storage tank to collect a first exhaust fluid from the storage tank, and a refrigerant pipe to liquefy the first exhaust fluid in the regeneration storage tank and maintain the liquefied first exhaust fluid at a predetermined temperature/pressure; a first exhaust pipe to transfer the first exhaust fluid from the storage tank to the exhaust fluid liquefier; and a resupply pipe to resupply the first exhaust fluid collected and liquefied in the exhaust fluid liquefier to the storage tank.