RETICLE AND METHOD FOR FORMING PATTERNS IN A SEMICONDUCTOR DEVICE USING THE SAME

    公开(公告)号:US20230065721A1

    公开(公告)日:2023-03-02

    申请号:US17824151

    申请日:2022-05-25

    Inventor: Soeun SHIN Jin CHOI

    Abstract: A reticle includes a mask substrate, a reflective layer on the mask substrate, and a mask pattern on the reflective layer, the mask pattern having image patterns to absorb light, and first patterns between the image patterns, the first patterns being openings, the first patterns having a honeycomb arrangement, in a plan view, such that seven of the first patterns are arranged at corresponding vertices and a center of a first regular hexagon, and each of the first patterns having a shape of a second regular hexagon that is rotated by 90 degrees relative to the first regular hexagon.

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