公开(公告)号：US20210325773A1

公开(公告)日：2021-10-21

申请号：US16952330

申请日：2020-11-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Soo Yong LEE ,  Seo Rim MOON ,  Kyung Jae PARK ,  Soo Ryong LEE ,  Kang-Min JUNG

IPC: G03F1/36 ,  G03F7/20 ,  H01L21/027

Abstract: An optical proximity correction method includes extracting first patterns from a pattern mask, performing lithography on at least a part of the first patterns to form first-first patterns, forming the first-first patterns at positions where the first patterns are formed, and performing correction on the pattern mask on which the first-first patterns are formed.