公开(公告)号：US20220035237A1

公开(公告)日：2022-02-03

申请号：US17245947

申请日：2021-04-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Soo Yong LEE ,  Min-Cheol KANG ,  U Seong KIM ,  Seung Hune YANG ,  Jee Yong LEE

IPC: G03F1/36 ,  G03F1/76 ,  G06T7/00 ,  G06T3/40

Abstract: A process proximity correction method is performed by a process proximity correction computing device which performs a process proximity correction (PPC) through at least one of a plurality of processors. The process proximity correction method includes: converting a target layout including a plurality of patterns into an image, zooming-in or zooming-out the image at a plurality of magnifications to generate a plurality of input channels, receiving the plurality of input channels and performing machine learning to predict an after-cleaning image (ACI), comparing the predicted after-cleaning image with a target value to generate an after-cleaning image error, and adjusting the target layout on the basis of the after-cleaning image error.

公开(公告)号：US20240162039A1

公开(公告)日：2024-05-16

申请号：US18483176

申请日：2023-10-09

Applicant: Samsung Electronics Co., Ltd.

Inventor： Bon Hyun GU ,  Soo Yong LEE ,  Bong Cheol KIM ,  Sang Ho LEE

IPC: H01L21/027 ,  H01L21/56 ,  H01L21/66

CPC classification number: H01L21/0274 ,  H01L21/565 ,  H01L22/12

Abstract: Provided is a method for manufacturing a photomask. The method comprises providing a pre-photomask, the pre-photomask including a first area, a second area configured to perform a first duty correction, and a third area configured to perform a second duty correction; forming a pre-photoresist pattern using the pre-photomask such that the pre-photoresist pattern has a stepped shape having at least three steps in a cross-sectional view of the pre-photoresist pattern; analyzing a profile of the pre-photoresist pattern in the cross-sectional view; and inserting an auxiliary pattern into at least one of the first to third areas, based on a result of the analyzing of the profile of the pre-photoresist pattern.

公开(公告)号：US20240036478A1

公开(公告)日：2024-02-01

申请号：US18350611

申请日：2023-07-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： Han Veen KOH ,  Soo Yong LEE ,  Moo-Joon SHIN ,  Kyoung Yoon PARK

IPC: G03F7/00

CPC classification number: G03F7/70441 ,  G03F7/705 ,  G03F7/70625

Abstract: Provided is a lithography model simulation method. The method comprises receiving a first mask image, generating a second mask image by simulating an optical model on the first mask image, generating at least one third mask image by simulating a quenching model on the second mask image, and generating a resist image by performing machine learning on the first mask image, the second mask image, and the third mask image. The generating of the resist image comprises outputting first output data by convolving the first mask image with a first kernel, outputting second output data by convolving the second mask image with a second kernel, outputting third output data by convolving the third mask image with a third kernel, and adding together the first to third output data. Each of the first to third kernels is or includes a free-form kernel.

公开(公告)号：US20250076847A1

公开(公告)日：2025-03-06

申请号：US18779613

申请日：2024-07-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Soo Yong LEE ,  Jee Yong LEE ,  Seung Hune YANG ,  Seong Tae JEONG

IPC: G05B19/4099

Abstract: A method for manufacturing a semiconductor device includes extracting coordinates of vertices of patterns from an optical proximity corrected layout data for an optical proximity corrected layout including the patterns; and inputting the coordinates of the vertices into a transformer model to output whether there is a Mask Rule Check (MRC) violation on the optical proximity corrected layout data.

公开(公告)号：US20230320097A1

公开(公告)日：2023-10-05

申请号：US18110052

申请日：2023-02-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Soo Yong LEE ,  Jung Min KIM

IPC: H10B43/27 ,  H10B43/10 ,  H10B43/35 ,  H10B43/40 ,  H10B41/10 ,  H10B41/27 ,  H10B41/35 ,  H10B41/40 ,  G11C16/04

CPC classification number: H10B43/27 ,  H10B43/10 ,  H10B43/35 ,  H10B43/40 ,  H10B41/10 ,  H10B41/27 ,  H10B41/35 ,  H10B41/40 ,  G11C16/0483

Abstract: A semiconductor device includes a substrate extending in a first direction and a second direction perpendicular to the first direction, the substrate disposed on a peripheral circuit region and has a cell array region formed therein, a first mold structure which includes insulating layers and gate electrode layers alternately stacked on the substrate, first and second channel structures penetrating, in a third direction perpendicular to the first direction and the second direction, the first mold structure and spaced apart from each other in the first direction, a separation structure penetrating the first mold structure in the third direction between the first and second channel structures and separating the gate electrode layers in the first direction, and first and second auxiliary channel structures penetrating a part of the first mold structure between the separation structure and the first channel structure, and between the separation structure and the second channel structure.

公开(公告)号：US20210325773A1

公开(公告)日：2021-10-21

申请号：US16952330

申请日：2020-11-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Soo Yong LEE ,  Seo Rim MOON ,  Kyung Jae PARK ,  Soo Ryong LEE ,  Kang-Min JUNG

IPC: G03F1/36 ,  G03F7/20 ,  H01L21/027

Abstract: An optical proximity correction method includes extracting first patterns from a pattern mask, performing lithography on at least a part of the first patterns to form first-first patterns, forming the first-first patterns at positions where the first patterns are formed, and performing correction on the pattern mask on which the first-first patterns are formed.

公开(公告)号：US20150091795A1

公开(公告)日：2015-04-02

申请号：US14502059

申请日：2014-09-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kun Sok KANG ,  Hak Sup SONG ,  Sang Il LEE ,  Joo Whan LEE ,  Seong Seol HONG ,  Soo Yong LEE ,  Mi Jin CHOI

IPC: G06F3/00 ,  G09G3/34 ,  G10L15/00 ,  H04N5/33

CPC classification number: G09G3/3406 ,  G06F3/011 ,  G09G2354/00 ,  G10L15/00 ,  G10L17/00

Abstract: There is provided a display device which includes a display panel, a backlight that has a plurality of light sources and applies light to the display panel, a human body detector configured to detect a human body located around the display panel, a human body information acquisition unit configured to acquire information on the human body, and a control that controls an operation of a user recognition unit when the human body is detected in a standby mode, performs user recognition based on the acquired human body information, controls an operation of the display panel such that notification information of the user is displayed in a portion of the display panel, and turns some light sources out of the plurality of light sources on. According to the invention, for the user who views the display device, the local dimming is performed on the backlight which provides content information desired by the user utilizing only a portion of the display device. Therefore, it is possible to increase dynamic contrast and reduce power consumption more than in global dimming. Accordingly, the user may enter a personalized mode of a TV, and content information is provided to the user in the standby mode.

Abstract translation: 提供了一种显示装置，其包括显示面板，具有多个光源并向显示面板施加光的背光源，构造成检测位于显示面板周围的人体的人体检测器，人体信息采集 被配置为获取关于人体的信息的单元，以及当在待机模式中检测到人体时控制用户识别单元的操作的控制，基于获取的人体信息执行用户识别，控制显示器的操作 面板，使得用户的通知信息被显示在显示面板的一部分中，并且从多个光源中的一些光源开始转动。 根据本发明，对于观看显示设备的用户，在背光源上执行局部调光，该背光源仅提供用户仅使用显示设备的一部分所期望的内容信息。 因此，与全局调光相比，可以增加动态对比度并降低功耗。 因此，用户可以进入电视的个性化模式，并且在待机模式中向用户提供内容信息。