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1.发明授权公开(公告)号：US11733616B2
公开(公告)日：2023-08-22
申请号：US17804732
申请日：2022-05-31
发明人： Takashi Sasa , Kyoung Whan Oh , Sang Ho Lee , Seok Heo , Ho Kyun Kim , Ju Hyung Lee
CPC分类号： G03F7/70908
摘要： A photoresist supplying system includes a pump that includes a first tube phragm that stores a photoresist and a filter that filters the photoresist, a second tube phragm that stores the photoresist and is disposed outside the pump, where the second tube phragm transfers the photoresist to the first tube phragm, a storage unit that stores the photoresist, where the storage unit provides the photoresist to the second tube phragm, and a tube phragm drive unit that is connected to the first tube phragm. The tube phragm drive unit adjusts an interior volume of the first tube phragm and applies a pressure to a flexible outer wall of the first tube phragm to transfer the photoresist from the first tube phragm to a nozzle installed in the chamber. At least a part of the photoresist stored in the first tube phragm is transferred to the second tube phragm.
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公开(公告)号：US20240105469A1
公开(公告)日：2024-03-28
申请号：US18358160
申请日：2023-07-25
发明人： Takashi Sasa , Kyoungwhan Oh , Hokyun Kim
CPC分类号： H01L21/67023 , B01D19/0031 , B01D19/0063 , B01D19/0068
摘要： A liquid supply system includes a liquid supply unit; a liquid pressurizer connected to the liquid supply unit; a compressor connected to the liquid pressurizer; a pump at a rear end of the liquid pressurizer to allow liquid to flow; an inflow control valve between the liquid supply unit and the liquid pressurizer; and an outflow control valve between the liquid pressurizer and the pump, wherein the liquid pressurizer is configured to supply liquid having a dissolved gas concentration that is lower than a dissolved gas concentration of liquid supplied from the liquid supply unit to the pump.
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3.发明申请公开(公告)号：US20230115351A1
公开(公告)日：2023-04-13
申请号：US17804732
申请日：2022-05-31
发明人： Takashi Sasa , Kyoung Whan Oh , Sang Ho Lee , Seok Heo , Ho Kyun Kim , Ju Hyung Lee
IPC分类号： G03F7/20
摘要： A photoresist supplying system includes a pump that includes a first tube phragm that stores a photoresist and a filter that filters the photoresist, a second tube phragm that stores the photoresist and is disposed outside the pump, where the second tube phragm transfers the photoresist to the first tube phragm, a storage unit that stores the photoresist, where the storage unit provides the photoresist to the second tube phragm, and a tube phragm drive unit that is connected to the first tube phragm. The tube phragm drive unit adjusts an interior volume of the first tube phragm and applies a pressure to a flexible outer wall of the first tube phragm to transfer the photoresist from the first tube phragm to a nozzle installed in the chamber. At least a part of the photoresist stored in the first tube phragm is transferred to the second tube phragm.
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