专利检索 ap:("SAMSUNG ELECTRONICS CO., LTD.") AND inv:"Yun Jong Choi" 第 1 页

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发明授权
System and method for controlling semiconductor manufacturing facility, method of manufacturing integrated circuit using the system and method, and method of manufacturing processor using the system and method 有权

公开(公告)号：US10553464B2

公开(公告)日：2020-02-04

申请号：US15950303

申请日：2018-04-11

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Jae Won Jeong , Yi Jin , Chang Gi Min , Jin Woo Lee , Seok Heo , Yong Won Choi , Yun Jong Choi

IPC分类号： H01L21/67 , G05B19/418

摘要： A method for controlling a semiconductor manufacturing facility includes measuring output change amounts of differential pressure sensors in the facility when pressure conditions change by a number of fans. The fans are then classified into different groups and subgroups and control sequences of the subgroups are determined based on the change amounts. Difference values are then calculated, and a control signal is generated to adjust the rotation speed of the fans.