SUBSTRATE PROCESSING APPARATUS
    1.
    发明公开

    公开(公告)号:US20240213077A1

    公开(公告)日:2024-06-27

    申请号:US18069478

    申请日:2022-12-21

    Applicant: SEMES CO, LTD.

    CPC classification number: H01L21/68742 H01L21/67051 H01L21/68764 H05F3/04

    Abstract: There is provided a substrate processing apparatus. The substrate processing apparatus may include a substrate supporter supporting a substrate, a processing solution feeder supplying a processing solution to the substrate, first and second recovery containers configured to recover the processing solution, a first pipe connected to the first recovery container and including an insulating material, a second pipe connected to the second recovery container and including an insulating material, a first static electricity eliminator in contact with the first pipe, a second static electricity eliminator in contact with the second pipe, and a plurality of first conductive lines connected to the first and second static electricity eliminators.

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