公开(公告)号：US20230211601A1

公开(公告)日：2023-07-06

申请号：US17945089

申请日：2022-09-15

Applicant: SEMES CO., LTD.

Inventor： Sung Ho KIM ,  Bo Yeon HWANG ,  Chang Jin MOON ,  Sol Min PARK ,  Sang Seok KIM

IPC: B41J2/045 ,  B41M5/00 ,  B41M3/00

CPC classification number: B41J2/04556 ,  B41M5/0047 ,  B41M5/007 ,  B41M3/006 ,  B41J2/04581

Abstract: The present disclosure provides a method for processing a substrate that can maintain a production amount even when a production model is changed. The method for processing a substrate comprises: disposing the substrate on a levitation stage; measuring a distance between the substrate and an inkjet head module; and changing a discharging speed of ink to be discharged from the inkjet head module based on the measured distance.