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公开(公告)号：US20220059309A1
公开(公告)日：2022-02-24
申请号：US17409840
申请日：2021-08-24
Applicant: SEMES CO., LTD.
Inventor： DOYEON KIM , HYUN YOON , Ho Jong Hwang
IPC: H01J37/02 , H01J37/317 , H01J37/20 , H01L21/687
Abstract: An apparatus for treating a substrate includes a process chamber that performs a liquid treatment process by dispensing a treatment liquid onto the substrate, and components provided in the process chamber. A surface of at least one of the components is formed of a material containing an ion-implanted fluorine resin.
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