BUFFER UNIT, AND APPARATUS AND METHOD FOR TREATING SUBSTRATE WITH THE UNIT

    公开(公告)号:US20200066561A1

    公开(公告)日:2020-02-27

    申请号:US16540859

    申请日:2019-08-14

    Inventor: DUKHYUN SON

    Abstract: A buffer unit for storing a substrate includes a housing having a buffer space inside, a substrate support unit that supports one or more substrates in the buffer space, a pressure adjustment unit that adjusts pressure in the buffer space, and a controller that controls the pressure adjustment unit. The pressure adjustment unit includes a gas supply line that supplies a gas for pressurizing the buffer space and a gas exhaust line that reduces the pressure in the buffer space. The controller controls the pressure adjustment unit to maintain the buffer space in a selected one of a filling mode in which the buffer space is filled with the gas and an exhaust mode in which the buffer space is evacuated.

    BUFFER UNIT, AND APPARATUS AND METHOD FOR TREATING SUBSTRATE WITH THE UNIT

    公开(公告)号:US20200066562A1

    公开(公告)日:2020-02-27

    申请号:US16546104

    申请日:2019-08-20

    Abstract: Embodiments of the inventive concept provide an apparatus and method for storing a substrate. A buffer unit for storing a substrate includes a housing having an entrance formed at one side and a buffer space inside, a substrate support unit that supports one or more substrates in the buffer space, a pressure adjustment unit that adjusts pressure in the buffer space, and a controller that controls the pressure adjustment unit. The pressure adjustment unit includes a gas supply line that supplies a gas for pressurizing the buffer space and a gas exhaust line that reduces the pressure in the buffer space. At least one of the gas supply line and the gas exhaust line includes a plurality of lines.

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