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公开(公告)号:US20250038023A1
公开(公告)日:2025-01-30
申请号:US18915552
申请日:2024-10-15
Applicant: SEMES CO., LTD.
Inventor: DUKHYUN SON , BYUNG KYU KIM
IPC: H01L21/673 , H01L21/677
Abstract: Disclosed is a container. The container includes a housing having an interior space, and a support part that supports an expendable component in the interior space, and the support part includes an alignment pin that aligns the expendable component.
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公开(公告)号:US20200066561A1
公开(公告)日:2020-02-27
申请号:US16540859
申请日:2019-08-14
Applicant: SEMES CO., LTD.
Inventor: DUKHYUN SON
IPC: H01L21/673 , H01L21/67
Abstract: A buffer unit for storing a substrate includes a housing having a buffer space inside, a substrate support unit that supports one or more substrates in the buffer space, a pressure adjustment unit that adjusts pressure in the buffer space, and a controller that controls the pressure adjustment unit. The pressure adjustment unit includes a gas supply line that supplies a gas for pressurizing the buffer space and a gas exhaust line that reduces the pressure in the buffer space. The controller controls the pressure adjustment unit to maintain the buffer space in a selected one of a filling mode in which the buffer space is filled with the gas and an exhaust mode in which the buffer space is evacuated.
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公开(公告)号:US20200066562A1
公开(公告)日:2020-02-27
申请号:US16546104
申请日:2019-08-20
Applicant: SEMES CO., LTD.
Inventor: DUKHYUN SON , SANG-KEE LEE
IPC: H01L21/673 , H01L21/683
Abstract: Embodiments of the inventive concept provide an apparatus and method for storing a substrate. A buffer unit for storing a substrate includes a housing having an entrance formed at one side and a buffer space inside, a substrate support unit that supports one or more substrates in the buffer space, a pressure adjustment unit that adjusts pressure in the buffer space, and a controller that controls the pressure adjustment unit. The pressure adjustment unit includes a gas supply line that supplies a gas for pressurizing the buffer space and a gas exhaust line that reduces the pressure in the buffer space. At least one of the gas supply line and the gas exhaust line includes a plurality of lines.
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