公开(公告)号：US10160001B2

公开(公告)日：2018-12-25

申请号：US15332184

申请日：2016-10-24

Applicant: SEMES CO., LTD.

Inventor： Gilsoo Park

IPC: B05C1/00 ,  H01L21/67 ,  H01L21/677

Abstract: An apparatus for treating a substrate is provided having a treating module, a buffer module, and an index module arranged in sequentially along a first direction. The index module includes a load port where a substrate receiving container places an index module configured to transfer the substrate between the load port and the buffer module. The buffer module includes a first and second buffer unit arranged along a second direction perpendicular to the first direction. The treating module includes a first treating unit, a second treating unit, a first transfer chamber, and a second transfer chamber, wherein the first transfer chamber includes a first transfer robot configured to transfer the substrate between the first buffer unit and the first treating unit, and wherein the second transfer chamber includes a second transfer robot configured to transfer the substrate between the second buffer unit and the second treating unit.