公开(公告)号：US11782348B2

公开(公告)日：2023-10-10

申请号：US17531988

申请日：2021-11-22

Applicant: SEMES CO., LTD.

Inventor： Ki Sang Eum ,  Gyeong Won Song ,  Yang Yeol Ryu ,  Kyung Jin Seo

IPC: G03F7/16 ,  B05C15/00 ,  B05C11/02

CPC classification number: G03F7/162 ,  B05C11/02 ,  B05C15/00

Abstract: The inventive concept provides an apparatus for treating a substrate. The apparatus comprises a processing container having an inner space; a support unit configured to support and rotate the substrate in the inner space; a liquid supply unit configured to supply a treating liquid to the substrate supported by the support unit; and an exhaust unit configured to exhaust an air flow from the inner space, wherein the exhaust unit includes an air flow guide duct with an inlet provided to introduce the air flow into the air flow guide duct in a tangential direction to a rotating direction of the substrate supported on the support unit.

公开(公告)号：US11714356B2

公开(公告)日：2023-08-01

申请号：US17469366

申请日：2021-09-08

Applicant: Semes Co., Ltd

Inventor： Jun Ho Kim ,  Sang Hoon Lee ,  Jong Seok Seo ,  Ho Jin Jang ,  Gyeong Won Song

IPC: G03F7/40 ,  G03F7/20 ,  G03F7/00 ,  G03F7/38

CPC classification number: G03F7/40 ,  G03F7/38 ,  G03F7/70933

Abstract: The inventive concept provides a bake unit. The bake unit comprising: a housing having an upper cover and a lower frame, the upper cover and the lower cover in combination providing a treatment space for heat treatment of a substrate; a heater provided in the treatment space for heating a substrate placed thereon; a heater cup configured to surround the heater; and a first purge gas supply unit for providing a first purge gas flow to block inflow of outer air through a gap between the lower frame and the heater cup.