公开(公告)号：US20220153030A1

公开(公告)日：2022-05-19

申请号：US17529323

申请日：2021-11-18

Applicant: SEMES CO., LTD.

Inventor： Byung Joo LEE ,  Sang Hwa LEE ,  Dong Yun LEE ,  Jee Yong JUNG ,  Hahn Seok JEON ,  Kang KWON ,  Jae Hun JEONG ,  Sang Hoon KIM

IPC: B41J2/165

Abstract: The present invention provides an apparatus for treating a substrate, the apparatus including: a head unit including a head formed with one or more nozzles that discharge a treatment liquid to a substrate; and a head maintenance unit configured to perform maintenance for the head, in which the head maintenance unit may include: a liquid receiving block formed with one or more liquid receiving parts having liquid receiving spaces with open tops; a decompression line fluidly-communicating with the liquid receiving space and configured to provide reduced pressure to the liquid receiving space; and a decompression valve installed in the decompression line.