公开(公告)号：US20220355344A1

公开(公告)日：2022-11-10

申请号：US17732691

申请日：2022-04-29

Applicant: SEMES CO., LTD.

Inventor： Hyun Seok Choi ,  Ki Young Kwak ,  Dong Hee Son ,  Jong Hwan Park ,  Jong Jin Jung

IPC: B08B3/02 ,  G03F7/42

Abstract: An apparatus and method for treating a substrate that implement a recipe capable of increasing an absorption amount of metal ions to the substrate are provided. The method for treating the substrate includes: ejecting a substrate treating liquid onto the substrate; rotating the substrate at a first low-speed; and when the ejecting of the substrate treating liquid has been finished, drying the substrate.