公开(公告)号：US20230311153A1

公开(公告)日：2023-10-05

申请号：US18101121

申请日：2023-01-25

Applicant: SEMES CO., LTD.

Inventor： Sung Hun EOM ,  Tae Won YUN ,  Yun Hwa HONG ,  Jong Kook BAE

IPC: B05C5/00 ,  B05C11/08 ,  B05D1/00

CPC classification number: B05C5/001 ,  B05C11/08 ,  B05D1/005

Abstract: A substrate processing apparatus, which may suppress occurrence of temperature deviation caused by an air current, is provided. The substrate processing apparatus includes a chamber including an upper body and a lower body and having a processing space formed therein by the upper body and the lower body, a substrate support unit disposed in the processing space and having a support surface on which the substrate is supported, a heater disposed to heat gas in the processing space, an introduction unit configured to supply gas toward an edge of the support surface, and a discharge unit configured to discharge the gas in the processing space. The discharge unit may include a plurality of outlets spaced apart from a centerline of the support surface in the upper body and disposed to be closer to the centerline of the support surface than to the introduction unit.