公开(公告)号：US11135624B2

公开(公告)日：2021-10-05

申请号：US16379294

申请日：2019-04-09

Applicant: SEMES CO., LTD.

Inventor： Mi Young Jo ,  Da Jeong Kim ,  Ye Rim Yeon ,  Jun Taek Koo

IPC: B08B7/00 ,  H01L21/02 ,  H01L21/67 ,  B08B3/10 ,  H01L21/324

Abstract: An embodiment of the present invention provides a substrate cleaning method including: supplying of a liquid cleaning solution containing a thermoreactive polymer resin in a solvent to a substrate; trapping of particles by gelling the liquid cleaning solution by phase transition through first heat treatment; liquefying of the gel-state cleaning solution with the particle trapped therein by phase transition through second heat treatment; and removing of the liquefied cleaning solution by supplying a rinse solution.