公开(公告)号：US20240207903A1

公开(公告)日：2024-06-27

申请号：US18393884

申请日：2023-12-22

Applicant: SEMES CO., LTD.

Inventor： Jongdoo Lee ,  Taejong Choi ,  Juyeon Song ,  Sangmin Lee

IPC: B08B3/04 ,  H01L21/67

CPC classification number: B08B3/04 ,  H01L21/67017

Abstract: Provided is a substrate processing apparatus including a body having a substrate treatment space therein, a fluid supply unit configured to supply a treatment fluid to the substrate treatment space, a fluid exhaust line to exhaust the treatment fluid from the substrate treatment space, a clamp body configured to surround and fix the body, a friction prevention member arranged between the body and the clamp body and configured to prevent friction between the body and the clamp body, a conductor extending along at least a portion of an outer rim of the friction prevention member, and a processor configured to detect whether the conductor has been deformed, based on an output signal that is output in response to an electrical signal applied to the conductor.