VALVE CONTROL DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

    公开(公告)号:US20240222150A1

    公开(公告)日:2024-07-04

    申请号:US18399894

    申请日:2023-12-29

    CPC classification number: H01L21/67017 G05D7/0652

    Abstract: A valve control device includes a plurality of valves respectively installed on a plurality of first pipes through which a supply fluid flows and configured to control opening and closing of the plurality of first pipes, a manifold including a second pipe connected to each of the plurality of valves and supplying a control gas to the plurality of valves, and a flow rate controller installed on the second pipe to adjust a flow rate of the control gas flowing through the second pipe, wherein the plurality of valves include at least one of a normal open (NO) type valve and a normal close (NC) valve.

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