公开(公告)号：US20240055276A1

公开(公告)日：2024-02-15

申请号：US18124277

申请日：2023-03-21

Applicant: SEMES CO., LTD.

Inventor： Seong Soo LEE ,  Dong Hee SON ,  Moon Sik CHOI

IPC: H01L21/67 ,  C02F1/68

CPC classification number: H01L21/67017 ,  C02F1/68 ,  C02F2103/02

Abstract: A chemical liquid supply unit and a substrate processing apparatus including the same are proposed, which is capable of efficiently removing contaminants in a chemical liquid.

公开(公告)号：US20250069897A1

公开(公告)日：2025-02-27

申请号：US18769749

申请日：2024-07-11

Applicant: SEMES CO., LTD.

Inventor： Min Jung KIM ,  Moon Sik CHOI

IPC: H01L21/3213 ,  H01L21/67

Abstract: Disclosed is a substrate processing apparatus including: a support unit for supporting a substrate and rotating the substrate; a solution discharge unit for discharging a processing solution including a first material and a second material onto the substrate to remove a film on the substrate; and a controller for controlling the solution discharge unit, in which the controller sets, when the solution discharge unit discharges the processing solution to a first position and a second position on the substrate, a hydrogen ion concentration of the processing solution discharged to the first position to be different from a hydrogen ion concentration of the processing solution discharged to the second position, and the first position is a center of the substrate or is located closer to the center of the substrate than the second position.