公开(公告)号：US20240157391A1

公开(公告)日：2024-05-16

申请号：US18382525

申请日：2023-10-22

Applicant: SEMES CO., LTD.

Inventor： Sung Jin BANG ,  Chang Suk OH

IPC: B05C5/02

CPC classification number: B05C5/027 ,  B05C5/0208

Abstract: Proposed is a substrate treating apparatus. The substrate treating apparatus includes a treating container having a treating space therein, a support unit supporting and rotate a substrate in the treating space, and a liquid supply unit supplying a treating liquid onto the substrate, wherein the liquid supply unit may include a nozzle member and an actuator for moving the nozzle member, wherein the nozzle member may include nozzles arranged along a first direction so that the nozzles form a first row and nozzles coupled to the body and arranged along the first direction so that the nozzles form a second row, wherein the first row and the second row may be spaced apart from each other in a second direction perpendicular to the first direction when viewed from above. At this time, the nozzles constituting the nozzle member may be observed as a whole from the front.