公开(公告)号：US20130108975A1

公开(公告)日：2013-05-02

申请号：US13665169

申请日：2012-10-31

Applicant: SEMES CO., LTD.

Inventor： UnKyu KANG ,  Sungun KIM

IPC: F03B11/02 ,  F27D7/00

CPC classification number: H01L21/67017 ,  Y10T137/8593

Abstract: Provided is a substrate treating apparatus. The substrate treating apparatus includes a chamber, a support member disposed within the chamber to support a substrate, and an exhaust member for exhausting a gas within an inner space of the chamber to the outside of the chamber. A trap space for collecting fumes contained in the gas is defined in the exhaust member.

Abstract translation: 提供了一种基板处理装置。 基板处理装置包括室，设置在室内以支撑基板的支撑构件以及用于将腔室的内部空间内的气体排出到室外的排气构件。 在排气构件中限定用于收集气体中所含的烟雾的捕集空间。