公开(公告)号：US20230046276A1

公开(公告)日：2023-02-16

申请号：US17884709

申请日：2022-08-10

Applicant: SEMES CO., LTD.

Inventor： Sang Min LEE ,  Woo Jin CHUNG ,  Ki Bong KIM

IPC: B05C5/02 ,  B05C11/10

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber providing a treating space; and a fluid supply unit supplying a treating fluid to the chamber, and wherein the fluid supply unit includes: a supply tank storing the treating fluid; a supply line connecting the supply tank and the chamber; and a plurality of valves installed at the supply line, and wherein any one valve among the plurality of valves is provided as a safety valve, and wherein the safety valve is opened after confirming that the chamber has been switched to a closed state when supplying the treating fluid from a tank to the chamber.