公开(公告)号：US20220163892A1

公开(公告)日：2022-05-26

申请号：US17531988

申请日：2021-11-22

Applicant: SEMES CO., LTD.

Inventor： KI SANG EUM ,  GYEONG WON SONG ,  YANG YEOL RYU ,  KYUNG JIN SEO

IPC: G03F7/16

Abstract: The inventive concept provides an apparatus for treating a substrate. The apparatus comprises a processing container having an inner space; a support unit configured to support and rotate the substrate in the inner space; a liquid supply unit configured to supply a treating liquid to the substrate supported by the support unit; and an exhaust unit configured to exhaust an air flow from the inner space, wherein the exhaust unit includes an air flow guide duct with an inlet provided to introduce the air flow into the air flow guide duct in a tangential direction to a rotating direction of the substrate supported on the support unit.

公开(公告)号：US20220163900A1

公开(公告)日：2022-05-26

申请号：US17531941

申请日：2021-11-22

Applicant: SEMES CO., LTD.

Inventor： KI SANG EUM ,  JUNG YUL LEE ,  SUN WOOK JUNG ,  YANG YEOL RYU

IPC: G03F7/20

Abstract: An apparatus for treating a substrate includes a processing container having an inner space; a support unit having a support plate configured to support and rotate the substrate in the inner space; a liquid supply unit configured to supply treating liquid to the substrate supported by the support unit; and an exhaust unit configured to exhaust an air flow in the inner space, wherein the exhaust unit includes an air flow guide duct guiding a flow direction of an air flow flowing on the substrate to an outer side of the substrate due to a rotation of the substrate supported by the support unit, and the air flow guide duct having an inlet into which an air flow is introduced, the inlet provided at a substantially same level with the substrate supported by the support unit.