公开(公告)号：US20230033534A1

公开(公告)日：2023-02-02

申请号：US17876527

申请日：2022-07-28

Applicant: SEMES CO., LTD.

Inventor： JUN YOUNG CHOI ,  KYU HWAN CHANG ,  CHUL GOO KIM ,  JUNG BONG CHOI ,  YOUNG IL LEE

IPC: H01L21/67 ,  B08B3/04 ,  B08B3/02 ,  B08B13/00

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating bath for liquid treating a plurality of substrates and having an accommodation space for accommodating a treating liquid; and a posture changing member for changing a posture of a substrate which is immersed in the treating liquid from a vertical posture to a horizontal posture.