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公开(公告)号:US20230033534A1
公开(公告)日:2023-02-02
申请号:US17876527
申请日:2022-07-28
Applicant: SEMES CO., LTD.
Inventor: JUN YOUNG CHOI , KYU HWAN CHANG , CHUL GOO KIM , JUNG BONG CHOI , YOUNG IL LEE
Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating bath for liquid treating a plurality of substrates and having an accommodation space for accommodating a treating liquid; and a posture changing member for changing a posture of a substrate which is immersed in the treating liquid from a vertical posture to a horizontal posture.