公开(公告)号：US20210020465A1

公开(公告)日：2021-01-21

申请号：US16931124

申请日：2020-07-16

Applicant: SEMES CO., LTD.

Inventor： Kyeong Seok JO ,  Yong Baek KIM ,  Han Bin CHOI

IPC: H01L21/67 ,  H01L21/687

Abstract: An apparatus for treating a substrate includes a support unit including a support plate that supports the substrate and a rotary drive member that rotates the support plate and a lower fluid dispensing unit that dispenses a fluid onto a lower surface of the substrate supported on the support plate. The rotary drive member includes a hollow shaft coupled with the support plate and an actuator that rotates the hollow shaft. The lower fluid dispensing unit includes a fixed shaft that has an interior space and that is provided in the hollow shaft and a fluid dispensing tube that dispenses the fluid and that is provided in the interior space. An air-flow generation part is formed on an outer surface of the fixed shaft to generate a downward air flow in a space between the hollow shaft and the fixed shaft when the hollow shaft rotates.