公开(公告)号：US20200227300A1

公开(公告)日：2020-07-16

申请号：US16741178

申请日：2020-01-13

Applicant: SEMES CO., LTD.

Inventor： Sang Kee LEE ,  Yoshiaki MORIYA

IPC: H01L21/683 ,  H01J37/32

Abstract: An electrostatic chuck that fixes a work substrate by an electrostatic force, the electrostatic chuck is disclosed. The electrostatic chuck includes a dielectric plate being configured to support the work substrate, a base plate being configured to support the dielectric plate and an adsorption electrode interposed between the dielectric plate and the base plate, and being configured to generate an electrostatic force for adsorbing the work substrate. The dielectric plate is a sapphire plate, the base plate consists of a alumina ceramic material, the adsorption electrode has a resistance change rate of 20% or less in a range of −200° C. to 400° C., and the dielectric plate and the base plate are integrally bonded through the adsorption electrode.