PHOTONIC CRYSTAL SEMICONDUCTOR LASER DEVICE AND METHOD FOR MANUFACTURING SAME

    公开(公告)号:US20240170918A1

    公开(公告)日:2024-05-23

    申请号:US18550592

    申请日:2022-03-17

    CPC classification number: H01S5/11 H01S5/04256 H01S5/222 H01S5/343

    Abstract: An embodiment of the present invention provides a photonic crystal semiconductor laser device including an n-type clad layer formed on a first surface of an n-type first substrate, a guide layer formed on the n-type clad layer and including an active layer, a p-type clad layer formed on the guide layer, a p-type contact layer formed on the p-type clad layer, a p-type electrode layer formed on the p-type contact layer, and an n-type electrode layer contacting at least a portion of the first surface of the n-type first substrate or a second surface opposing the first surface, wherein holes penetrating the p-type contact layer, the p-type clad layer, the guide layer including the active layer, and the n-type clad layer are formed in the p-type contact layer, the p-type clad layer, the guide layer including the active layer, and the n-type clad layer, and the holes form a photonic crystal pattern.

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