公开(公告)号：US20190227430A1

公开(公告)日：2019-07-25

申请号：US16370927

申请日：2019-03-30

Applicant: SHANDONG UNIVERSITY OF SCIENCE AND TECHNOLOGY

Inventor： Qing WANG ,  Jintao ZHANG ,  Rui ZHANG ,  Xu ZHENG ,  Lijun MA ,  Xingyuan ZHANG ,  Wenquan DU

IPC: G03F7/00 ,  B82Y40/00 ,  B29C59/02

Abstract: A mold with cavities for nanoimprint lithography and a method of imprinting the same. The mold is a one-piece structure, including an upper mold and a lower mold which are welded together. The upper mold is evenly provided with a plurality of stepped holes. A plurality of grooves are provided at an upper surface of the lower mold. Both ends of each groove are respectively connected to an external high-pressure water pump and an external vacuum pump via pipelines. An airtight cavity is additionally provided at the interior of the mold to form a negative pressure in the cavity by vacuumizing during the imprint process. In the demolding, a crack is formed at the interface between the mold and the imprint resist by using water pressure and expands to the entire interface for the demolding of the imprinted structure.