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公开(公告)号:US20230023499A1
公开(公告)日:2023-01-26
申请号:US17856769
申请日:2022-07-01
发明人: Manabu DAIO , TOMOKO TERANISHI , Satoshi IHIDA , CHIHIRO TACHINO
IPC分类号: C12M1/34 , C12M1/12 , C12M3/06 , G01N27/414
摘要: A cell culture apparatus includes: a substrate having a first surface; a pair of structures each having a wall surface intersecting the first surface, the wall surfaces facing each other; and an electrode disposed on the first surface and traversing a space between the wall surfaces, the electrode and each of the wail surfaces forming an angle other than 90 degrees.
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公开(公告)号:US20230243774A1
公开(公告)日:2023-08-03
申请号:US17928586
申请日:2021-04-21
IPC分类号: G01N27/27 , G01N27/414
CPC分类号: G01N27/27 , G01N27/4148
摘要: A cell signal measurement electrode plate includes a first transistor including a gate terminal connected to a first selection line and a source terminal connected to a second selection line, a second transistor including a gate terminal connected to a drain terminal of the first transistor, a source terminal connected to an electrode, and a drain terminal connected to a common wiring line, and a first capacitor including one capacitance electrode connected to the drain terminal of the first transistor and another capacitance electrode connected to a capacitance element potential fixing wiring line.
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公开(公告)号:US20200078790A1
公开(公告)日:2020-03-12
申请号:US16563344
申请日:2019-09-06
发明人: CHIHIRO TACHINO , KAZUYA TSUJINO , ATSUSHI HACHIYA
IPC分类号: B01L3/00
摘要: An electrowetting device includes a first substrate, a plurality of first electrodes formed on the first substrate, a dielectric layer formed on the plurality of first electrodes, a first water-repellent layer formed on the dielectric layer, a second substrate, a second electrode formed on the second substrate, and a second water-repellent layer formed on the second electrode. The first substrate and the second substrate are arranged with a gap between the first water-repellent layer and the second water-repellent layer. The first electrode includes an indium oxide-zinc oxide layer, the dielectric layer includes a silicon nitride layer, and the silicon nitride layer is formed directly on the indium oxide-zinc oxide layer.
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