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公开(公告)号：US10809560B2
公开(公告)日：2020-10-20
申请号：US16068880
申请日：2018-03-06
Inventor： Lanyan Li
IPC: G02B5/20 , G02F1/1335 , G02B1/111 , G02F1/1339 , G02F1/1362 , G03F7/00
Abstract: A manufacturing method of a color filter substrate includes Step S1: providing a base and forming an antireflection layer on the base; and Step S2: forming a color resist layer on the antireflection layer, in which the color resist layer is formed through a photolithographic process including operations of coating photoresist, exposure, and development. With the arrangement of the antireflection layer under the color resist layer, in a photolithographic process of the color resist layer, due to the arrangement of the antireflection layer under the photoresist, during exposure of the photoresist, the antireflection layer absorbs ultraviolet light incident into the antireflection layer and weakens, through destructive interference, reflection light emitting from the contact interface between the photoresist and the antireflection layer to eliminate the standing wave effect, the swing effect, and the notching effect of photolithography and improve key dimension consistency and pattern distinguishability of the color resist units.
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公开(公告)号：US09904097B2
公开(公告)日：2018-02-27
申请号：US14914638
申请日：2015-12-23
Inventor： Lanyan Li , Yuheng Liang
IPC: H01J9/00 , H01J9/24 , G02F1/1335 , G02F1/1339 , B05D1/00 , G02F1/1368
CPC classification number: G02F1/133516 , B05D1/005 , B82Y20/00 , B82Y40/00 , G02F1/1335 , G02F1/133512 , G02F1/133528 , G02F1/133617 , G02F1/13394 , G02F1/1368 , G02F2001/133614 , G02F2001/13396 , G02F2202/36
Abstract: The present invention provides a method for manufacturing a quantum dot color filter substrate, in which a black photoresist layer and a transparent photoresist layer are first coated and formed on a backing plate in sequence and then, first, second, and third patterns of a photo mask having different grey levels are used to pattern the black photoresist layer and the transparent photoresist layer to obtain a plurality of transparent barrier walls corresponding to the first pattern, sub spacers corresponding to the second pattern and located on the transparent barrier walls, and main spacers corresponding to the third pattern and located on the transparent barrier walls and also to obtain a plurality of black barrier walls covered by the plurality of transparent barrier walls, the plurality of black barrier walls and the plurality of transparent barrier walls located thereon collectively defining a plurality of pixel barrier walls; and then, patterned quantum dot layers are formed in sub-pixel zones that are delimited and surrounded by the plurality of pixel barrier walls by means of inkjet printing such that accuracy of inkjet printing is greatly improved.
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公开(公告)号：US20180031910A1
公开(公告)日：2018-02-01
申请号：US14914638
申请日：2015-12-23
Inventor： Lanyan Li , Yuheng Liang
IPC: G02F1/1335 , G02F1/1368 , B05D1/00 , G02F1/1339
CPC classification number: G02F1/133516 , B05D1/005 , B82Y20/00 , B82Y40/00 , G02F1/1335 , G02F1/133512 , G02F1/133528 , G02F1/133617 , G02F1/13394 , G02F1/1368 , G02F2001/133614 , G02F2001/13396 , G02F2202/36
Abstract: The present invention provides a method for manufacturing a quantum dot color filter substrate, in which a black photoresist layer and a transparent photoresist layer are first coated and formed on a backing plate in sequence and then, first, second, and third patterns of a photo mask having different grey levels are used to pattern the black photoresist layer and the transparent photoresist layer to obtain a plurality of transparent barrier walls corresponding to the first pattern, sub spacers corresponding to the second pattern and located on the transparent barrier walls, and main spacers corresponding to the third pattern and located on the transparent barrier walls and also to obtain a plurality of black barrier walls covered by the plurality of transparent barrier walls, the plurality of black barrier walls and the plurality of transparent barrier walls located thereon collectively defining a plurality of pixel barrier walls; and then, patterned quantum dot layers are formed in sub-pixel zones that are delimited and surrounded by the plurality of pixel barrier walls by means of inkjet printing such that accuracy of inkjet printing is greatly improved.
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