公开(公告)号：US12257595B2

公开(公告)日：2025-03-25

申请号：US18119401

申请日：2023-03-09

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Masaaki Furuya ,  Hiroaki Kobayashi ,  Hideki Mori

IPC: B05C11/10

Abstract: According to one embodiment, a processing liquid supply device includes a plurality of tanks, a supply path that supplies a processing liquid to a processing device, a heating unit that heats the processing liquid, a dilution unit that dilutes the processing liquid, a new-liquid supply unit that supplies a new liquid, a common flow path through which the processing liquid of the plurality of tanks passes, a switching unit that switches between the plurality of tanks so that at least a tank is selected from which the processing liquid passes to the common flow path, a densitometer provided in the common flow path, and a control device that controls at least one of the heating unit, the dilution unit, and the new-liquid supply unit so that the concentration reaches a target value set in advance.