公开(公告)号：US11891470B2

公开(公告)日：2024-02-06

申请号：US17612674

申请日：2020-05-13

Applicant: SHOWA DENKO K.K.

Inventor： Yuki Miura ,  Yuji Hashimoto ,  Keiichi Nakamura

IPC: C08F36/18 ,  C08F6/00

CPC classification number: C08F36/18 ,  C08F6/003

Abstract: A method for producing a chloroprene-based polymer latex which can efficiently remove a residual volatile organic substance from the chloroprene-based polymer latex while suppressing the deposition of agglomerates is provided. In the method for producing a chloroprene-based polymer latex of the present invention, when the residual volatile organic substance comprised in the latex is volatilized and removed, a mixed fluid of one or more gases selected from the group consisting of inert gases and air, and water is contacted with the latex at a gas pressure higher than the saturated water vapor pressure, and a temperature of the mixed fluid is a temperature lower than a boiling point of water at the gas pressure.