Invention Grant
- Patent Title: Method for producing chloroprene-based-polymer latex
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Application No.: US17612674Application Date: 2020-05-13
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Publication No.: US11891470B2Publication Date: 2024-02-06
- Inventor: Yuki Miura , Yuji Hashimoto , Keiichi Nakamura
- Applicant: SHOWA DENKO K.K.
- Applicant Address: JP Tokyo
- Assignee: Resonac Corporation
- Current Assignee: Resonac Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP 19103105 2019.05.31
- International Application: PCT/JP2020/019042 2020.05.13
- International Announcement: WO2020/241251A 2020.12.03
- Date entered country: 2021-11-19
- Main IPC: C08F36/18
- IPC: C08F36/18 ; C08F6/00

Abstract:
A method for producing a chloroprene-based polymer latex which can efficiently remove a residual volatile organic substance from the chloroprene-based polymer latex while suppressing the deposition of agglomerates is provided. In the method for producing a chloroprene-based polymer latex of the present invention, when the residual volatile organic substance comprised in the latex is volatilized and removed, a mixed fluid of one or more gases selected from the group consisting of inert gases and air, and water is contacted with the latex at a gas pressure higher than the saturated water vapor pressure, and a temperature of the mixed fluid is a temperature lower than a boiling point of water at the gas pressure.
Public/Granted literature
- US20220242979A1 METHOD FOR PRODUCING CHLOROPRENE-BASED-POLYMER LATEX Public/Granted day:2022-08-04
Information query
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