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公开(公告)号:US11062929B2
公开(公告)日:2021-07-13
申请号:US16223014
申请日:2018-12-17
发明人: Jens Eckstein , Peter Reustle , Mathias Hohlmayer , Uemit Seyhan , Benjamin Mandlmeier , Michael Reising , Stefan Kempf , Jan-Christof Jacobi
IPC分类号: H01L21/677 , H01L21/67 , H01L21/306 , H01L21/02 , B05C1/02
摘要: A device for treating substrates by a treating liquid has at least one rotatably supported support roller which a substrate to be treated rests on during operation. The support roller has a hollow cylinder having a porous rigid material which the substrate to be treated rests on during operation. The device is configured to deliver, during operation, treating liquid via the interior of the hollow cylinder of the at least one support roller through the porous rigid material to the external surface of the hollow cylinder in order to treat at least one surface of the substrate by the treating liquid. The device is configured to treat several substrates in the form of plate-shaped separate wafers arranged one behind the other and/or next to one another in the device, by the treating liquid and to transport the substrates in a transport plane during the treatment.
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公开(公告)号:US20210335585A1
公开(公告)日:2021-10-28
申请号:US17056739
申请日:2019-04-04
发明人: Bernhard Cord , Michael Reising , Dieter Scherger , Torsten Dippell , Frank May , Peter Wohlfart , Oliver Hohn
IPC分类号: H01J37/32 , H01L31/18 , H01L21/677 , H01J37/34 , C23C14/56 , C23C16/54 , C23C16/50 , C23C14/34 , C23C14/06
摘要: A continuous machine (100) for coating substrates (103) comprises a process module (130) and a vacuum lock (110, 150) for introducing the substrates (103) or removing the substrates (103). The vacuum lock (110, 150) comprises a chamber for receiving a substrate carrier (102) with a plurality of substrates (103) and a flow channel arrangement for evacuating and venting the chamber. The flow channel arrangement comprises a first channel for evacuating and venting the chamber and a second channel for evacuating and venting the chamber, wherein the first channel and the second channel are arranged at opposing sides of the chamber.
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公开(公告)号:US11597998B2
公开(公告)日:2023-03-07
申请号:US16767743
申请日:2018-11-28
发明人: Bernhard Cord , Michael Reising , Dieter Scherger
摘要: A vacuum lock for a vacuum coating plant comprises a chamber for receiving a substrate carrier, wherein the chamber comprises a first and a second inner surface. A conveyor is configured for conveying the substrate carrier. The vacuum lock comprises a flow channel assembly for evacuating and venting the chamber, the flow channel assembly being configured to cause a gas flow between both the first inner surface and a first substrate carrier surface facing the first inner surface and between the second inner surface and a second substrate carrier surface facing the second inner surface. The substrate carrier can be positioned between the first and the second inner surfaces such that a ratio of a first distance between the first inner surface and the first substrate carrier surface to a length (L) of the substrate carrier is smaller than 0.1, and a ratio of a second distance between the second inner surface and the second substrate carrier surface to a length (L) of the substrate carrier is smaller than 0.1.
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公开(公告)号:US20210189559A1
公开(公告)日:2021-06-24
申请号:US17252456
申请日:2019-03-20
发明人: Oliver Hohn , Michael Reising , Johannes Grübler , Kurt Pietsch , Jörg Koch
IPC分类号: C23C16/448 , G05D23/19 , B01B1/00 , C23C16/52
摘要: The present invention is directed to a method and an apparatus for providing vapor for a discontinuous process.
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