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1.发明授权公开(公告)号：US11062929B2
公开(公告)日：2021-07-13
申请号：US16223014
申请日：2018-12-17
发明人： Jens Eckstein , Peter Reustle , Mathias Hohlmayer , Uemit Seyhan , Benjamin Mandlmeier , Michael Reising , Stefan Kempf , Jan-Christof Jacobi
IPC分类号： H01L21/677 , H01L21/67 , H01L21/306 , H01L21/02 , B05C1/02
摘要： A device for treating substrates by a treating liquid has at least one rotatably supported support roller which a substrate to be treated rests on during operation. The support roller has a hollow cylinder having a porous rigid material which the substrate to be treated rests on during operation. The device is configured to deliver, during operation, treating liquid via the interior of the hollow cylinder of the at least one support roller through the porous rigid material to the external surface of the hollow cylinder in order to treat at least one surface of the substrate by the treating liquid. The device is configured to treat several substrates in the form of plate-shaped separate wafers arranged one behind the other and/or next to one another in the device, by the treating liquid and to transport the substrates in a transport plane during the treatment.
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2.发明公开公开(公告)号：US20230246118A1
公开(公告)日：2023-08-03
申请号：US17913088
申请日：2021-03-24
CPC分类号： H01L31/208 , H01L31/206 , H01L31/1868 , H01L31/1864 , H01L31/02245
摘要： The present invention is directed to a method as well as to a machine for producing a starting material for a silicon solar cell with passivated contacts.
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