专利检索 ap:("SK SILTRON CO., LTD.") AND inv:"Ji Hwan CHO" 第 1 页

1.

发明申请
APPARATUS OF CLEANING A POLISHING PAD AND POLISHING DEVICE 有权

公开(公告)号：US20220161390A1

公开(公告)日：2022-05-26

申请号：US17199163

申请日：2021-03-11

申请人： SK SILTRON CO., LTD.

发明人： Ji Hwan CHO

IPC分类号： B24B53/017 , B24B53/00

摘要： An apparatus of cleaning a polishing pad includes: a first gas nozzle for spraying gas onto the pores of the polishing pad; and a first liquid nozzle for spraying a liquid to the pores of the polishing pad.