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公开(公告)号:US20180164164A1
公开(公告)日:2018-06-14
申请号:US15104095
申请日:2015-05-05
Applicant: SOUTHEAST UNIVERSITY
Inventor: Weihua Li , Lei Wang , Lu Zhang , Zaifa Zhou
CPC classification number: G01L1/086 , G01L1/00 , G01L5/0047 , H01L22/34
Abstract: A thin film material residual testing structure comprises two groups of structures. The first group of structures comprises an electrostatic driven polysilicon cantilever beam, an asymmetrical cross beam made of thin film material to be tested and having an alignment structure, and a double-end fixed support beam made of the thin film material to be tested. The second group of structures is similar to the structure of the first group with the fixed support beam removed. A residual stress testing method includes separating the loading drive part of force from a residual stress testing structure made of the thin film material to be tested, designing the bending deflection of a control testing structure according to geometrical parameters, extracting the force applied on the residual stress testing structure and utilizing force and deflection to calculate the residual stress of the thin film material to be tested.
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公开(公告)号:US10088375B2
公开(公告)日:2018-10-02
申请号:US15104095
申请日:2015-05-05
Applicant: Southeast University
Inventor: Weihua Li , Lei Wang , Lu Zhang , Zaifa Zhou
Abstract: A thin film material residual testing structure comprises two groups of structures. The first group of structures comprises an electrostatic driven polysilicon cantilever beam, an asymmetrical cross beam made of thin film material to be tested and having an alignment structure, and a double-end fixed support beam made of the thin film material to be tested. The second group of structures is similar to the structure of the first group with the fixed support beam removed. A residual stress testing method includes separating the loading drive part of force from a residual stress testing structure made of the thin film material to be tested, designing the bending deflection of a control testing structure according to geometrical parameters, extracting the force applied on the residual stress testing structure and utilizing force and deflection to calculate the residual stress of the thin film material to be tested.
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