THIN FILM MATERIAL RESIDUAL STRESS TESTING STRUCTURE AND METHOD

    公开(公告)号:US20180164164A1

    公开(公告)日:2018-06-14

    申请号:US15104095

    申请日:2015-05-05

    CPC classification number: G01L1/086 G01L1/00 G01L5/0047 H01L22/34

    Abstract: A thin film material residual testing structure comprises two groups of structures. The first group of structures comprises an electrostatic driven polysilicon cantilever beam, an asymmetrical cross beam made of thin film material to be tested and having an alignment structure, and a double-end fixed support beam made of the thin film material to be tested. The second group of structures is similar to the structure of the first group with the fixed support beam removed. A residual stress testing method includes separating the loading drive part of force from a residual stress testing structure made of the thin film material to be tested, designing the bending deflection of a control testing structure according to geometrical parameters, extracting the force applied on the residual stress testing structure and utilizing force and deflection to calculate the residual stress of the thin film material to be tested.

    Thin film material residual stress testing structure and method

    公开(公告)号:US10088375B2

    公开(公告)日:2018-10-02

    申请号:US15104095

    申请日:2015-05-05

    Abstract: A thin film material residual testing structure comprises two groups of structures. The first group of structures comprises an electrostatic driven polysilicon cantilever beam, an asymmetrical cross beam made of thin film material to be tested and having an alignment structure, and a double-end fixed support beam made of the thin film material to be tested. The second group of structures is similar to the structure of the first group with the fixed support beam removed. A residual stress testing method includes separating the loading drive part of force from a residual stress testing structure made of the thin film material to be tested, designing the bending deflection of a control testing structure according to geometrical parameters, extracting the force applied on the residual stress testing structure and utilizing force and deflection to calculate the residual stress of the thin film material to be tested.

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